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Resist LIthography

См. также в других словарях:

  • positive-resist lithography — pozityvinė fotolitografija statusas T sritis radioelektronika atitikmenys: angl. positive resist lithography vok. Positivresistlithografie, f rus. фотолитография по позитивному фоторезисту, f pranc. lithographie sur le photorésist positif, f …   Radioelektronikos terminų žodynas

  • Resist — is also an album by Kosheen and a song by Rush. In semiconductor fabrication, resist refers to both: # A thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via… …   Wikipedia

  • Lithography — Charles Marion Russell s The Custer Fight (1903). Note the range of tones, fading toward the edges …   Wikipedia

  • Resist für Mikrostrukturlithografie — smulkiosios litografijos rezistas statusas T sritis radioelektronika atitikmenys: angl. fine featured resist; fine line lithography resist vok. Resist für Mikrostrukturlithografie, n rus. резист для литографии элементов уменьшенных размеров, m… …   Radioelektronikos terminų žodynas

  • résist pour lithographie des microstructures — smulkiosios litografijos rezistas statusas T sritis radioelektronika atitikmenys: angl. fine featured resist; fine line lithography resist vok. Resist für Mikrostrukturlithografie, n rus. резист для литографии элементов уменьшенных размеров, m… …   Radioelektronikos terminų žodynas

  • resist —    A substance which protects a surface from receiving paints, inks, or dyes. Waxes are commonly used as a resist to the dyes used in batik. Also see beeswax, blockout, clean up, lithography, paraffin, and solvent …   Glossary of Art Terms

  • Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …   Wikipedia

  • Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… …   Wikipedia

  • Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …   Wikipedia

  • X-ray lithography — is a next generation lithography that has been developed for the semiconductor industryref|vlad. Batches of microprocessors have already been produced. The short wavelengths of 0.8 nm X rays overcome diffraction limits in the resolution of… …   Wikipedia

  • Immersion lithography — is a photolithography resolution enhancement technique that replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one. The resolution is increased by a factor equal… …   Wikipedia

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